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Trimethylsilylacetylene
4.18 psi ( 20 °C)
98%
liquid
n20/D 1.388 (lit.)
53 °C (lit.)
0.709 g/cm3 (lit.)
2-8°C
Laser-induced polymerization of gaseous ethynyltrimethylsilane was used for efficient chemical vapour deposition of polycarbosilane films. Ethynyltrimethylsilane acts as substrate for nickel-catalyzed cross-coupling with benzonitriles.
Ethynyltrimethylsilane was used in:
microwave-assisted, one-pot, three-step Sonogashira cross-coupling-desilylation-cycloaddition reaction for the preparation of 1,4-disubstituted 1,2,3-triazoles
synthesis of poly(ethynyltrimethylsilane) containing Pd (II) coordination sites
pyrazole synthesis via 1,3-dipolar cycloaddition of diazo compounds to acetylenes
Fluorinated bottle or combination packing drum according to the quantity.